Characterization of nanoporous ultra low-k thin films templated by copolymers with different architectures
نویسندگان
چکیده
Triblock, diblock and random copolymers of poly(ethylene oxide) and poly(propylene oxide) are used as molecular templates in poly(methyl silsesquioxane) (MSQ) matrices to fabricate ultra low-k dielectric materials (kp2:0). Solidstate NMR shows that polymer architecture plays an important role in the polymer domain size and the polymer– matrix interface in the nanocomposites. Positronium annihilation lifetime spectroscopy reveals that porous MSQ film templated by triblock copolymers ( % Mn in the range of B5000–12,000 g/mol) have smallest pores and highest percolation threshold compared to those templated by diblock and random copolymers. r 2003 Elsevier Science Ltd. All rights reserved.
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